Eindhoven, Netherlands

Chung-Hsun Li

USPTO Granted Patents = 8 

Average Co-Inventor Count = 7.1

ph-index = 2

Forward Citations = 7(Granted Patents)


Company Filing History:


Years Active: 2019-2025

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8 patents (USPTO):

Title: Chung-Hsun Li - Inspiring the Next Generation of Innovators

Introduction:

Chung-Hsun Li is a visionary inventor based in Eindhoven, NL, whose passion for innovation and dedication to excellence have made him a beacon for aspiring inventors and entrepreneurs alike. With a remarkable journey characterized by creativity and perseverance, he continues to shape a brighter future for all.

Latest Patents:

Chung-Hsun Li holds an impressive number of 7 patents, with his latest inventions centered around cutting-edge methods and apparatus for measuring properties of substrates. One of his patents focuses on producing a sampling plan for measuring critical dimensions or overlay of wafer substrates, while another patent introduces a method for determining overlay values of substrates based on temperature data.

Career Highlights:

Currently employed at ASML Netherlands B.V., Chung-Hsun Li thrives in an environment that fosters innovation and technological advancement. His work at ASML has been instrumental in pushing the boundaries of substrate measurement and overlay determination, showcasing his expertise in the field of semiconductor technology.

Collaborations:

Collaborating closely with talented individuals like Wouter Lodewijk Elings and Franciscus Bernardus Maria Van Bilsen, Chung-Hsun Li has been able to exchange ideas, drive innovation, and bring his inventions to life. Together, they form a dynamic team that consistently delivers groundbreaking solutions in the realm of semiconductor technology.

Conclusion:

In conclusion, Chung-Hsun Li's unwavering commitment to innovation and his relentless pursuit of excellence serve as an inspiration to all who aspire to make a difference through their inventions. His work at ASML and his collaborations with industry experts highlight his invaluable contributions to the field of substrate measurement and overlay determination, setting a high standard for the next generation of inventors and entrepreneurs to follow.

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