Chun-Ming Yang

Title: Innovations of Chun-Ming Yang

Introduction

Chun-Ming Yang is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 4 patents. His work focuses on advanced methods for forming semiconductor structures, which are crucial for the development of modern electronic devices.

Latest Patents

One of his latest patents is titled "Method for forming multi-gate semiconductor structure." This patent describes a method that involves receiving a substrate with a fin structure, removing portions of the fin to expose a source/drain region, and forming a semiconductor layer in that region. The process continues with the removal of additional portions of the fin to expose a channel region, followed by cleaning the surface of the channel and forming an interfacial layer over it.

Another notable patent is "Gate resistance improvement and method thereof." This patent outlines a fin field-effect transistor (finFET) device that includes a substrate, a fin, and a gate structure. The gate structure features a work-function metal layer and a filler gate metal layer, with a self-assembled monolayer positioned between them. This innovative design aims to enhance the performance of finFET devices.

Career Highlights

Chun-Ming Yang is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His expertise and innovative approaches have contributed to the advancement of semiconductor technologies, making him a valuable asset to his company.

Collaborations

Throughout his career, Chun-Ming Yang has collaborated with notable colleagues, including Ju-Li Huang and Hsin-Che Chiang. These collaborations have fostered a productive environment for innovation and development in semiconductor research.

Conclusion

Chun-Ming Yang's contributions to semiconductor technology through his patents and collaborations highlight his role as a key inventor in the field. His work continues to influence the advancement of electronic devices and semiconductor manufacturing processes.