This inventor holds 5 USPTO granted patents. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2002-2018.
Company Filing History:
Years Active: 2002-2018
Title: Innovations of Chun-Hung Kung
Introduction
Chun-Hung Kung is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, holding a total of 5 patents. His work focuses on enhancing photolithography processes and developing advanced materials for semiconductor applications.
Latest Patents
One of his latest patents is titled "Anti-ESD photomask and method of forming the same." This patent provides a method for creating an anti-ESD photomask, which includes forming a light-shielding layer on a substrate that contains a Mo-containing layer. The method also involves a surface treatment operation to convert the surfaces of both the substrate and the light-shielding layer into a non-conductive layer. Another notable patent is "System and method for photolithography in semiconductor manufacturing." This invention outlines a method that includes providing masks for a wafer, defining reference focus planes for multiple masks, and determining the best focus for the second mask based on the first mask's focus and the Z direction difference.
Career Highlights
Chun-Hung Kung is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His expertise in photolithography and materials science has positioned him as a valuable asset to the company.
Collaborations
He has collaborated with notable colleagues such as Hao-Zhang Lai and Chi-Hung Liao, contributing to various projects that advance semiconductor technology.
Conclusion
Chun-Hung Kung's innovative work in semiconductor manufacturing and his contributions to photolithography processes highlight his importance in the field. His patents reflect a commitment to advancing technology and improving manufacturing techniques.