The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 28, 2002
Filed:
Jan. 19, 1999
Chun-Hung Kung, Hsin-Chu, TW;
Taiwan Semiconductor Manufacturing Company, Hsin-Chu, TW;
Abstract
Methods for a die to die and a die to database inspection of phase shifting masks is described. A layer of partially transmitting material, such as an anti-reflection coating, is formed on the mask covering the phase shifting mask elements. The mask is then illuminated by a light source and the light transmitted through the mask is detected. Defects in the pattern of phase shifting mask elements will cause a difference in the amount of light transmitted through the defect when compared to a defect free phase shifting mask element. This difference can be used to perform a die to die inspection or a die to database inspection of the pattern of phase shifting mask elements.