Location History:
- Hsinshu, TW (2018)
- Hsinchu, TW (2017 - 2019)
Company Filing History:
2 out of 9,152 
1 out of 309 
1 out of 4,304 
Years Active: 2017-2025
Title: Chuan-Wei Tsou: Innovator in Epitaxial Technology
Introduction
Chuan-Wei Tsou is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of epitaxial technology, holding a total of 5 patents. His work focuses on the development of advanced materials and methods that enhance the performance of semiconductor devices.
Latest Patents
Among his latest patents is the invention of an epitaxial substrate and a method for forming the same. This invention includes a substrate, a deposition layer, a buffer layer, and an epitaxial layer. The deposition layer is directly formed on the substrate and features a gradient doping concentration, which optimizes heat dissipation efficiency and minimizes leakage current. Another notable patent is the structure of an epitaxial wafer and the method of fabricating it. This wafer consists of a silicon wafer with a central area and an extremity area that has a stepped profile, enhancing its structural integrity and performance.
Career Highlights
Chuan-Wei Tsou has worked with esteemed organizations such as the Industrial Technology Research Institute and Globalwafers Co., Ltd. His experience in these companies has allowed him to refine his expertise in semiconductor technology and epitaxial processes.
Collaborations
Throughout his career, Tsou has collaborated with notable colleagues, including Shuo-Hung Hsu and Po-Chun Yeh. These collaborations have contributed to the advancement of his research and innovations in the field.
Conclusion
Chuan-Wei Tsou is a distinguished inventor whose work in epitaxial technology has led to significant advancements in semiconductor materials. His patents reflect a commitment to innovation and excellence in the industry.