Chuan-Ling Wu

Title: Chuan-Ling Wu: Innovator in Semiconductor Device Fabrication

Introduction

Chuan-Ling Wu is an inventor based in Yuanlin Township, Taiwan. He has made contributions to the field of semiconductor device fabrication. His innovative approach focuses on improving the efficiency of the manufacturing process.

Latest Patent Applications

Chuan-Ling Wu has submitted a patent application titled "METHOD OF REMOVING RESIDUE DURING SEMICONDUCTOR DEVICE FABRICATION." This method involves forming a first photoresist feature and a second photoresist feature on a semiconductor substrate. A chemical material coating is created on the semiconductor substrate, interposing the first and second photoresist features. The process includes rinsing the semiconductor substrate, which removes the chemical material coating. This method also addresses the removal of residue that may be present between the photoresist features.

Conclusion

Chuan-Ling Wu's work in semiconductor device fabrication highlights his innovative approach to improving manufacturing processes. His contributions, although not yet resulting in granted patents, demonstrate his commitment to advancing technology in this field.