Chu-Wei Hu

Title: Innovations of Chu-Wei Hu

Introduction

Chu-Wei Hu is a prominent inventor based in Taichung, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 12 patents. His work focuses on innovative methods that enhance the efficiency and reliability of semiconductor devices.

Latest Patents

One of his latest patents is titled "Photoresist mask-free oxide define region (ODR)." This invention discloses a method for defining an oxide define region without the use of a photomask. The process involves depositing a pad oxide and a stop layer over the peaks of a semiconductor wafer substrate. The pad oxide is typically silicon oxide, while the stop layer is made of silicon nitride. Following this, high-density plasma (HDP) oxide is deposited over the pad oxide, stop layer, and valleys of the substrate. A hard mask, such as silicon nitride, is then applied over the oxide, followed by the deposition of photoresist. The photoresist is etched back to expose the peaks of the hard mask, which are then etched through to the stop layer. The photoresist is subsequently removed, allowing for chemical-mechanical planarization (CMP) to be performed on the remaining hard mask and oxide.

Another notable patent is a "Method to prevent passivation layer peeling in a solder bump formation process." This method aims to reduce the peeling of a cross-linked polymer passivation layer during solder bump formation. It involves providing a multi-level semiconductor device on a process wafer with a metal bonding pad. A layer of resinous precursor polymeric material is formed over the surface, which has a specific glass transition temperature (Tg) upon curing. The wafer undergoes a pre-curing thermal treatment below Tg, followed by a subsequent thermal treatment above Tg to create an uppermost passivation layer.

Career Highlights

Chu-Wei Hu is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work has significantly impacted the development of advanced semiconductor technologies.

Collaborations

He has collaborated with notable colleagues, including Chung-Te Lin and Kuo-Hua Pan, contributing to various innovative projects within the semiconductor field.

Conclusion

Chu-Wei Hu's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence