San Francisco, CA, United States of America

Christopher Prucha

This inventor holds 18 USPTO granted patents and 4 published patent applications, plus 1 CIPO patent and 2 EPO patents, primarily in Additive Manufacturing. Top assignees: Stratasys, Inc., Origin Laboratories, Inc.. Active years: 2020-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Christopher Prucha. Retrieved from https://idiyas.com/inventor/christopher-prucha

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 18 

% Patents Active = 100.0

 

 

Average Co-Inventor Count = 2.6

ph-index = 3

Forward Citations = 13(Granted Patents)


Location History:

  • San Francisco, CA (US) (2020 - 2024)
  • Eden Prairie, MN (US) (2024)

Company Filing History:


Years Active: 2020-2026

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Areas of Expertise:
3D Printing
Polymerization
Temperature Regulation
Build Separation
Window Separation
Curing Interface
Interlayer Control
Material Testing
Failure Detection
Feedback Control
Resin Interface
18 patents (USPTO):Explore Patents

Title: The Innovative Journey of Christopher Prucha

Introduction: Christopher Prucha is a visionary inventor based in San Francisco, CA, known for his groundbreaking contributions to the tech industry.

Latest Patents: Christopher Prucha holds several patents in the field of artificial intelligence and machine learning, revolutionizing how technology interacts with the world.

Career Highlights: With a background in computer science, Christopher Prucha has worked with top tech companies, leading research institutions, and universities to push the boundaries of innovation.

Collaborations: Throughout his career, Christopher Prucha has collaborated with renowned experts in the tech industry, fostering a culture of creativity and forward thinking.

Conclusion: Christopher Prucha's dedication to innovation and his relentless pursuit of technological advancement continue to inspire the next generation of inventors and entrepreneurs.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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