Wappingers Falls, NY, United States of America

Christopher N Collins

USPTO Granted Patents = 10 (Patent Applications = 1)

Average Co-Inventor Count = 5.6

ph-index = 4

Forward Citations = 85(Granted Patents)

Location History:

Poughkeepsie, NY (US) (1998 - 2002)
Wappinger Falls, NY (US) (2014 - 2016)
Wappingers Falls, NY (US) (2019)

Company Filing History:

8 out of 164,108

International Business Machines Corporation

Years Active: 1998-2019

where 'Filed Patents' based on already Granted Patents

10 patents (USPTO):Sort by Forward Citations

Abstract keywords

1. 10170337 - Implant after through-silicon via (TSV) etch to getter mobile ions (2019-01-01),

2. 10170304 - Self-aligned nanotube structures (2019-01-01),

3. 9252133 - Electrical leakage reduction in stacked integrated circuits having through-silicon-via (TSV) structures (2016-02-02),

4. 8907494 - Electrical leakage reduction in stacked integrated circuits having through-silicon-via (TSV) structures (2014-12-09),

5. 6440813 - Process of manufacturing a DRAM cell capacitor having increased trench capacitance (2002-08-27),

6. 6328041 - Universal cleaning wafer for a plasma chamber (2001-12-11),

7. 6188096 - DRAM cell capacitor having increased trench capacitance (2001-02-13),

8. 5948193 - Process for fabricating a multilayer ceramic substrate from thin (1999-09-07),

9. 5874162 - Weighted sintering process and conformable load tile (1999-02-23),

10. 5741131 - Stacking system for substrates (1998-04-21),

Title: The Innovative Contributions of Christopher N Collins

Introduction

Christopher N Collins is a notable inventor based in Wappingers Falls, NY (US). He has made significant contributions to the field of semiconductor technology, holding a total of 10 patents. His work focuses on advanced materials and methods that enhance the performance and reliability of semiconductor devices.

Latest Patents

Among his latest patents, Collins has developed self-aligned nanotube structures. This innovation relates to semiconductor structures and methods of manufacture, specifically involving nanotube structures supported by spacers and insulator materials. Another significant patent involves a method for implanting a dopant after through-silicon via (TSV) etch to getter mobile ions. This method includes disposing a mask on a substrate, etching a trench, and implanting a dopant capable of gettering mobile ions that can contaminate the substrate.

Career Highlights

Throughout his career, Collins has worked with prominent companies in the technology sector. He has been associated with International Business Machines Corporation (IBM) and Globalfoundries Inc., where he has contributed to various innovative projects and advancements in semiconductor technology.

Collaborations

Collins has collaborated with several talented individuals in his field. Notable coworkers include Michael A Cohn and Ryan Wayne Wuthrich, who have also made significant contributions to semiconductor research and development.

Conclusion

Christopher N Collins exemplifies the

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1 patent pending:

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