The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 11, 2001
Filed:
Sep. 18, 1998
Applicant:
Inventors:
Jeffrey J. Brown, Fishkill, NY (US);
Christopher N. Collins, Poughkeepsie, NY (US);
Wilson Tong Lee, Hopewell Junction, NY (US);
George A. Kaplita, Wappingers Falls, NY (US);
Stefan Schmitz, Pleasant Valley, NY (US);
Len Yuan Tsou, New City, NY (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B 7/04 ; B08B 7/00 ;
U.S. Cl.
CPC ...
B08B 7/04 ; B08B 7/00 ;
Abstract
A cleaning wafer is used during the vaporization of particulate deposits that were previously deposited on the walls of a plasma chamber. The cleaning wafer includes a first dielectric layer, a conducting layer and a second dielectric layer covering the conducting layer.