The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 01, 2019
Filed:
Jan. 13, 2016
International Business Machines Corporation, Armonk, NY (US);
Christopher Collins, Wappingers Falls, NY (US);
Mukta G. Farooq, Hopewell Junction, NY (US);
Troy L. Graves-Abe, Wappingers Falls, NY (US);
Brian J. Greene, Fishkill, NY (US);
Robert Hannon, Wappingers Falls, NY (US);
Herbert L. Ho, Cornwall, NY (US);
Chandrasekharan Kothandaraman, New York, NY (US);
INTERNATIONAL BUSINESS MACHINES CORPORATION, Armonk, NY (US);
Abstract
A method of making a semiconductor device includes disposing a mask on a substrate; etching the mask to form an opening in the mask; etching a trench in the substrate beneath the opening in the mask; and implanting a dopant in an area of the substrate beneath the opening of the mask, the dopant capable of gettering mobile ions that can contaminate the substrate; wherein the dopant extends through the substrate from a sidewall of the trench and an endwall of the trench.