IDiyas

For the Inventor, By the Inventor

Pittsford, NY, United States of America

Christopher Alan Lee

USPTO Granted Patents = 12 

 

Average Co-Inventor Count = 3.1

ph-index = 2

Forward Citations = 12(Granted Patents)


Company Filing History:

goldMedal12 out of 7,268 
 
Corning Incorporated
 patents

Years Active: 2004-2023

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12 patents (USPTO):
1. 11555791 - Chamber for vibrational and environmental isolation of thin wafers (2023-01-17),
2. 11551347 - Devices, systems, and methods of generating and providing a target topographic map for finishing a photomask blank subject to functional requirements on flatness (2023-01-10),
3. 10871369 - Systems for and methods of measuring photomask flatness with reduced gravity-induced error (2020-12-22),
4. 9829310 - Interferometric roll-off measurement using a static fringe pattern (2017-11-28),
5. 9513214 - Skewed sectional measurement of striated glass (2016-12-06),
6. 8531677 - Frequency-shifting interferometer with selective data processing (2013-09-10),
7. 8379219 - Compound interferometer with monolithic measurement cavity (2013-02-19),
8. 8218586 - Littman configured frequency stepped laser (2012-07-10),
9. 7986414 - Measurement of multiple surface test objects with frequency scanning interferometer (2011-07-26),
10. 7916763 - Current driven frequency-stepped radiation source and methods thereof (2011-03-29),
11. 7286238 - Feature isolation for frequency-shifting interferometry (2007-10-23),
12. 6757067 - Fringe pattern discriminator for grazing incidence interferometer (2004-06-29),

Title: The Innovations of Christopher Alan Lee

Introduction

Christopher Alan Lee is a notable inventor based in Pittsford, NY (US). He has made significant contributions to the field of technology, holding a total of 12 patents. His work primarily focuses on advancements in measurement cavities and photomask finishing techniques.

Latest Patents

One of his latest patents is for a chamber designed for vibrational and environmental isolation of thin wafers. This invention includes a cylindrical chamber with two open ends, each sealed by caps that hermetically enclose the chamber. The design ensures that the transmissibility of an input force at 60 Hz is reduced by a factor of at least 10, with a natural frequency exceeding 300 Hz. Another significant patent involves devices, systems, and methods for generating a target topographic map for finishing a photomask blank. This method includes receiving topographic data and functional specifications to create a map that guides the removal of material, ensuring the photomask blank meets the required flatness specifications.

Career Highlights

Christopher Alan Lee is currently employed at Corning Incorporated, where he continues to innovate and develop new technologies. His work has had a profound impact on the industry, particularly in the areas of precision measurement and material processing.

Collaborations

Throughout his career, Christopher has collaborated with talented individuals such as Thomas James Dunn and Mark Joseph Tronolone. These partnerships have contributed to the success of his projects and the advancement of technology in their respective fields.

Conclusion

Christopher Alan Lee's contributions to innovation and technology are noteworthy, with a focus on enhancing measurement techniques and photomask processing. His work continues to influence the industry and inspire future advancements.

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