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For the Inventor, By the Inventor

Darmstadt, Germany

Christof Baur

This inventor holds 33 USPTO granted patents and 10 published patent applications and 3 EPO patents, primarily in Photolithography Technology. Top assignees: Carl Zeiss Smt Gmbh, Carl Zeiss Sms Ltd.. Active years: 2014-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Christof Baur. Retrieved from https://idiyas.com/inventor/christof-baur

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 33 

% Patents Active = 93.9

 

Average Co-Inventor Count = 2.8

ph-index = 2

Forward Citations = 19(Granted Patents)


Location History:

  • Germany, DE (2015)
  • Darmstadt, DE (2014 - 2024)

Company Filing History:

goldMedal31 out of 1,482 
 
Carl Zeiss Smt Gmbh
 patents
silverMedal2 out of 83 
 
Carl Zeiss Sms Ltd.
 patents

Years Active: 2014-2026

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Areas of Expertise:
Photolithographic Mask
Scanning Probe Microscope
Particle Removal
Defect Analysis
Sample Processing
Bending Beam Control
Probe System
Surface Examination
Charged Particle Beam
Time Extension Techniques
High Aspect Ratio Surfaces
Specimen Surface Modification
33 patents (USPTO):Explore Patents
1. 12761242 - Methods and devices for extending a time period until changing a measuring tip of a scanning probe microscope (2026-10-13),
2. 12681382 - Method and apparatuses for disposing of excess material of a photolithographic mask (2026-07-14),
3. 12601968 - Method and apparatus for processing a sample (2026-04-14),
4. 12517442 - Apparatus and method for removing a single particulate from a substrate (2026-01-06),
5. 12517426 - Method and apparatus for removing a particle from a photolithographic mask (2026-01-06),
6. 12493238 - Method, device and computer program for repairing a mask defect (2025-12-09),
7. 12405289 - Device and method for operating a bending beam in a closed control loop (2025-09-02),
8. 12292680 - Method and apparatuses for disposing of excess material of a photolithographic mask (2025-05-06),
9. 12164226 - Method and apparatuses for disposing of excess material of a photolithographic mask (2024-12-10),
10. 11977097 - Methods and devices for extending a time period until changing a measuring tip of a scanning probe microscope (2024-05-07),
11. 11965910 - Device and method for operating a bending beam in a closed control loop (2024-04-23),
12. 11899359 - Method and apparatus for removing a particle from a photolithographic mask (2024-02-13),
13. 11886126 - Apparatus and method for removing a single particulate from a substrate (2024-01-30),
14. 11874598 - Method and apparatuses for disposing of excess material of a photolithographic mask (2024-01-16),
15. 11796563 - Apparatus and method for a scanning probe microscope (2023-10-24),

Title: The Innovative Journey of Christof Baur

Introduction: Christof Baur, a visionary inventor hailing from Darmstadt, Germany, has made significant contributions to the world of technology and innovation.

Latest Patents: Christof Baur's latest patents focus on cutting-edge advancements in renewable energy technologies, smart city solutions, and sustainable urban development.

Career Highlights: With a career spanning over two decades, Christof Baur has been at the forefront of pioneering projects that have reshaped the way we interact with our environment. His work has been recognized globally for its ingenuity and impact.

Collaborations: Throughout his career, Christof Baur has collaborated with leading research institutions, universities, and innovative companies to bring his ideas to life. His collaborative spirit has led to groundbreaking inventions that have set new standards in the industry.

Conclusion: Christof Baur's relentless pursuit of innovation and his passion for creating a sustainable future have established him as a trailblazer in the field of technology. His work continues to inspire and drive positive change on a global scale.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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