The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 30, 2024
Filed:
Jul. 07, 2021
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Klaus Edinger, Lorsch, DE;
Christian Felix Hermanns, Frankfurt am Main, DE;
Tilo Sielaff, Darmstadt, DE;
Jens Oster, Ober-Ramstadt, DE;
Christof Baur, Darmstadt, DE;
Maksym Kompaniiets, Weißenhorn, DE;
Carl Zeiss SMT GmbH, Oberkochen, DE;
Abstract
The present application relates to an apparatus and to a method for removing at least a single particulate from a substrate, especially an optical element for extreme ultraviolet (EUV) photolithography, wherein the apparatus comprises: (a) an analysis unit designed to determine at least one constituent of a material composition of the at least one single particulate; and (b) at least one gas injection system designed to provide a gas matched to the particular constituent in an environment of the at least one single particulate; (c) wherein the matched gas contributes to removing the at least one single particulate from the substrate.