Darmstadt, Germany

Tilo Sielaff

This inventor holds 2 USPTO granted patents and 1 published patent application and 4 EPO patents. Top assignee: Carl Zeiss Smt Gmbh. Active years: 2024-2026.

USPTO Granted Patents = 2 

% Patents Active = 100.0

 

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2024-2026

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2 patents (USPTO):Explore Patents

Title: Tilo Sielaff: Innovator in Photolithography Technology

Introduction

Tilo Sielaff is a notable inventor based in Darmstadt, Germany. He has made significant contributions to the field of photolithography, particularly in the development of methods and apparatuses for removing particulates from substrates. His work is essential for advancing technologies used in extreme ultraviolet (EUV) photolithography.

Latest Patents

Tilo Sielaff holds 2 patents, with his latest invention focusing on an apparatus and method for removing a single particulate from a substrate. This invention is particularly relevant for optical elements used in EUV photolithography. The apparatus includes an analysis unit designed to determine the material composition of the particulate and a gas injection system that provides a gas matched to the particulate's constituents. This innovative approach enhances the efficiency of removing particulates from substrates.

Career Highlights

Throughout his career, Tilo Sielaff has worked with prominent companies in the industry. He has been associated with Carl Zeiss SMT GmbH and Hoerbiger Antriebstechnik Holding GmbH. His experience in these organizations has contributed to his expertise in photolithography technologies.

Collaborations

Tilo Sielaff has collaborated with notable professionals in his field, including Klaus Edinger and Christian Felix Hermanns. These collaborations have further enriched his work and innovations in the industry.

Conclusion

Tilo Sielaff is a distinguished inventor whose contributions to photolithography technology have made a significant impact. His innovative patents and collaborations reflect his commitment to advancing the field.

Profile summary based on public USPTO records.
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