Ching-Yuan Ho

Title: Innovations of Ching-Yuan Ho in Semiconductor Technology

Introduction

Ching-Yuan Ho is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 5 patents. His work focuses on methods for manufacturing semiconductor devices and improving their performance.

Latest Patents

Ching-Yuan Ho's latest patents include innovative methods for manufacturing semiconductor devices. One notable patent describes a method for manufacturing a semiconductor device that involves forming a first metal conductive line, creating a semiconductor device on it, and aligning a dielectric layer with a contact window. This method ensures that the semiconductor device is precisely aligned with the metal plug used for etching. Another patent focuses on fabricating semiconductor devices to lower source/drain sheet resistance. This method utilizes selective epitaxial growth and heat treatment to form silicide without consuming the silicon substrate, thereby maintaining the depth of the junction region and reducing resistance.

Career Highlights

Throughout his career, Ching-Yuan Ho has worked with notable organizations such as the Industrial Technology Research Institute and Worldwide Semiconductor Manufacturing Corporation. His experience in these institutions has allowed him to develop and refine his innovative techniques in semiconductor manufacturing.

Collaborations

Ching-Yuan Ho has collaborated with several professionals in his field, including Chen-Hsin Lien and Yung-Hsiang Chen. These collaborations have contributed to the advancement of semiconductor technologies and the successful implementation of his patented methods.

Conclusion

Ching-Yuan Ho's contributions to semiconductor technology through his patents and career achievements highlight his role as an influential inventor in the industry. His innovative methods continue to shape the future of semiconductor manufacturing.