Chin-Yung Chang

Title: Innovations of Chin-Yung Chang

Introduction

Chin-Yung Chang is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 5 patents. His work focuses on advanced manufacturing methods and systems that enhance production efficiency.

Latest Patents

One of his latest patents is a mask ROM fabrication method. This method involves sequentially forming a gate dielectric layer and a first photoresist layer on a substrate. It includes steps such as allowing light with a wavelength of 365 nm to pass through a first phase shift mask to photolithographically create a plurality of first trenches. These trenches have a width ranging from 243-365 nm. The method also involves doping the substrate to form embedded bit lines and forming polysilicon word lines, ultimately reducing the line width of mask ROM and decreasing its area.

Another significant patent is a system and method for manufacturing planning and control. This customer-oriented system includes an order management module that receives product orders and reserves capacity based on a capacity model. A plan engine generates a fixed production schedule, while a priority management engine assigns priorities to orders. The system also features a production schedule monitor that evaluates whether the order conforms to the fixed schedule and adjusts priorities based on historical production data.

Career Highlights

Chin-Yung Chang has worked with prominent companies in the semiconductor industry, including Taiwan Semiconductor Manufacturing Company Ltd. and Nuvoton Technology Corporation. His experience in these organizations has allowed him to develop innovative solutions that address complex manufacturing challenges.

Collaborations

He has collaborated with notable colleagues such as Jen-Lin Chao and Chen-Wei Hsu, contributing to various projects that enhance semiconductor technology.

Conclusion

Chin-Yung Chang's contributions to the field of semiconductor manufacturing through his innovative patents and collaborations highlight his role as a key inventor in the industry. His work continues to influence advancements in technology and production efficiency.