Chin-Pen Yeh

Title: Chin-Pen Yeh: Innovator in Semiconductor Technology

Introduction

Chin-Pen Yeh is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 10 patents. His work focuses on developing advanced semiconductor memory devices and single gate semiconductor devices.

Latest Patents

One of his latest patents involves a semiconductor memory device that includes a substrate, a well region in the substrate, a patterned first dielectric layer on the substrate extending over the well region, a patterned first gate structure on the patterned first dielectric layer, a patterned second dielectric layer on the patterned first gate structure, and a patterned second gate structure on the patterned second dielectric layer. The first gate structure features a cross pattern with sections extending in orthogonal directions. Another notable patent is for a single gate semiconductor device that has multiple doping regions on both sides of the gate, allowing the gate to be shared by a transistor and a capacitor.

Career Highlights

Chin-Pen Yeh is currently employed at Macronix International Co., Ltd., where he continues to innovate in semiconductor technology. His work has been instrumental in advancing the capabilities of memory devices, which are crucial for modern electronics.

Collaborations

Chin-Pen Yeh has collaborated with notable colleagues, including Cheng-Chi Lin and Shih-Chin Lien, contributing to various projects that enhance semiconductor technology.

Conclusion

Chin-Pen Yeh's contributions to semiconductor technology through his patents and collaborations highlight his role as a leading inventor in the field. His innovative work continues to impact the electronics industry significantly.