Company Filing History:
Years Active: 2017-2022
Title: Innovator Chin-Hsiang Chang: Pioneering Polishing Systems in Semiconductor Manufacturing
Introduction
Chin-Hsiang Chang is a distinguished inventor based in New Taipei, Taiwan, known for his innovative contributions to semiconductor manufacturing technologies. With a total of three patents to his name, he has made significant advancements in polishing systems that enhance wafer processing efficiencies.
Latest Patents
One of Chin-Hsiang Chang's latest patents is a method of using a polishing system. This method involves securing a wafer to a support with a first diameter and polishing it using a first polishing pad that has a second diameter greater than the first. After polishing, the support is rotated about a second axis perpendicular to the first, and the wafer is further polished using a second polishing pad with a diameter less than the first. The pioneering process concludes with the release of the wafer from the support after polishing.
Another notable patent from Chang describes a polishing system that includes a wafer support designed to hold a wafer with a first diameter. This innovative system also incorporates a first polishing pad that polishes a specific region of the wafer, alongside an auxiliary polishing system which is equipped with at least one second polishing pad. This second pad polishes a separate region of the wafer, maintaining the efficacy of the polishing process.
Career Highlights
Chin-Hsiang Chang is currently employed at Taiwan Semiconductor Manufacturing Company Limited (TSMC), one of the largest and most advanced semiconductor manufacturers in the world. His expertise in wafer polishing systems is instrumental in the development of technologies that enhance the precision and performance of semiconductor devices.
Collaborations
Throughout his career, Chang has had the opportunity to collaborate with talented colleagues, including Shih-Chi Lin and Kun-Tai Wu. Together, they have contributed to innovative solutions in semiconductor fabrication processes, furthering the industry’s advancements.
Conclusion
Chin-Hsiang Chang remains a pivotal figure in semiconductor innovation, with his patented technologies playing a crucial role in enhancing wafer polishing processes. His work at Taiwan Semiconductor Manufacturing Company Limited showcases his commitment to innovation and excellence in the field, ensuring that the semiconductor industry continues to progress and evolve.