Chih Po Huang

Title: Chih Po Huang: Innovator in Semiconductor Technology

Introduction

Chih Po Huang is a prominent inventor based in Hsin-Chu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His work focuses on the development of advanced semiconductor devices that enhance performance and efficiency.

Latest Patents

Huang's latest patents include innovative designs for semiconductor devices. One notable patent describes a semiconductor device that features multiple low voltage N-well (LVNW) areas biased at different potentials. These areas are isolated from a substrate by a common N-buried layer (NBL) and at least one high voltage N-well (HVNW) area. The LVNW areas are coupled to the common, subjacent NBL through a common P-buried layer (PBL). Another patent outlines a method for forming a substrate usable in a semiconductor device, which involves implanting P-type impurity ions into the PBL and growing a P-type epitaxial layer over it. Additionally, he has developed methods and apparatus for semiconductor devices that include both low and high voltage transistors, utilizing advanced isolation techniques.

Career Highlights

Chih Po Huang is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work has significantly impacted the development of semiconductor technologies, contributing to the advancement of high-performance electronic devices.

Collaborations

Huang has collaborated with notable colleagues in his field, including Chi-Hsuen Chang and Chung-I Chen. These partnerships have fostered innovation and the sharing of ideas, further enhancing the quality of their work.

Conclusion

Chih Po Huang is a key figure in semiconductor innovation, with a focus on developing advanced technologies that improve device performance. His contributions continue to shape the future of the semiconductor industry.