Hsinchu, Taiwan

Chih-Pin Wang

USPTO Granted Patents = 7 

Average Co-Inventor Count = 4.4

ph-index = 1


Company Filing History:


Years Active: 2021-2025

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7 patents (USPTO):Explore Patents

Title: Chih-Pin Wang: Innovator in Semiconductor Technology

Introduction

Chih-Pin Wang is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 7 patents. His work focuses on innovative solutions that enhance the performance and reliability of integrated circuits.

Latest Patents

Among his latest patents is the "Permeance Magnetic Assembly." This invention features a magnetic assembly that includes an inner permeance annulus and an outer permeance annulus connected via magnets. The outer annulus has a peak region with a thickness greater than other regions, which optimizes its magnetic properties. Another notable patent is the "Passivation Layer for Integrated Circuit Structure and Forming the Same." This patent describes an integrated circuit (IC) structure that includes a substrate, interconnect structure, metal lines, a liner, a protecting layer, and a nitride-free passivation layer. The design ensures that the passivation layer continuously extends from the liner to the protecting layer, forming a robust interface.

Career Highlights

Chih-Pin Wang is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at TSMC has positioned him as a key player in advancing semiconductor technologies.

Collaborations

Chih-Pin Wang has collaborated with notable colleagues, including Ching-Hou Su and Tsung-Jen Yang. These partnerships have fostered innovation and contributed to the development of cutting-edge technologies in the semiconductor field.

Conclusion

Chih-Pin Wang's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor. His work continues to impact the industry positively, paving the way for future advancements.

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