Chih-Fen Chen is a prominent inventor based in Taoyuan, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 8 patents. His work focuses on improving processes and devices within the semiconductor industry.

Latest Patents

One of his latest patents is a method for calibrating temperature in chemical vapor deposition. This method involves providing a semiconductor substrate that defines at least one first trench. The trench has a specific depth, and a coating layer is deposited onto the substrate using a precursor under a set processing temperature. The processing temperature is determined based on a depth parameter of the coating layer. Another notable patent is related to a semiconductor device and its manufacturing method. This device includes a gate stack over a semiconductor substrate, with a spacer along the sidewall of the gate stack. The design features an epitaxy structure and a liner that wraps around it, showcasing innovative engineering in semiconductor fabrication.

Career Highlights

Chih-Fen Chen works at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His expertise and innovative approaches have contributed to the advancement of semiconductor technologies.

Collaborations

Chih-Fen has collaborated with notable coworkers, including Chui-Ya Peng and Bang-Yu Huang. Their teamwork has fostered an environment of innovation and excellence in their projects.

Conclusion

Chih-Fen Chen is a key figure in semiconductor innovation, with a strong portfolio of patents that reflect his expertise and contributions to the field. His work continues to influence the development of advanced semiconductor technologies.

This text is generated by artificial intelligence and may not be accurate.

Please report any incorrect information to support@idiyas.com