Chia-Yuan Chang

Title: Chia-Yuan Chang: Innovator in Semiconductor Technology

Introduction

Chia-Yuan Chang is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 15 patents. His work focuses on advancing the capabilities of semiconductor devices, which are crucial for modern electronics.

Latest Patents

Among his latest patents is a design for a fin field effect transistor that incorporates conformal and non-conformal gate dielectric layers. This innovative semiconductor device includes a method for forming a fin that extends from a substrate, with a gate dielectric layer applied along the top surface and sidewalls of the fin. Notably, the thickness of the gate dielectric layer varies, being greater along the top surface than along the sidewalls. Another significant patent involves a triple layer high-k gate dielectric stack for workfunction engineering. This method details the process of providing first and second channel layers in NMOS and PMOS regions of a substrate, along with the deposition of multiple layers of hafnium oxide to enhance device performance.

Career Highlights

Chia-Yuan Chang has worked with notable organizations such as the Industrial Technology Research Institute and Taiwan Semiconductor Manufacturing Company. His experience in these institutions has allowed him to develop and refine his innovative ideas in semiconductor technology.

Collaborations

Throughout his career, Chang has collaborated with esteemed colleagues, including Xiong-Fei Yu and Nang-Ping Tu. These partnerships have contributed to the advancement of his research and the successful development of his patents.

Conclusion

Chia-Yuan Chang's contributions to semiconductor technology through his patents and collaborations highlight his role as a leading inventor in the field. His innovative approaches continue to influence the development of advanced electronic devices.