Chia-Jung Hsu

Title: Chia-Jung Hsu: Innovator in Microelectronics

Introduction

Chia-Jung Hsu is a prominent inventor based in Hsin-Chu, Taiwan. He has made significant contributions to the field of microelectronics, particularly in the development of etching compositions and methods. With a total of 6 patents to his name, Hsu's work has advanced the technology used in semiconductor manufacturing.

Latest Patents

Hsu's latest patents include innovative compositions and methods for selectively etching hard mask layers and photoresist etch residues. One notable invention relates to a composition and process for selectively etching titanium nitride and/or photoresist etch residues relative to low-k dielectric layers. This invention ensures that other materials present on the microelectronic device are not substantially removed or corroded by the etching compositions. Another significant patent describes a method for selectively removing aluminum oxide or nitride material from a microelectronic substrate. This method involves using an aqueous etching composition that includes a source of fluoride and a metal corrosion inhibitor, with a pH range of 3 to 8.

Career Highlights

Throughout his career, Chia-Jung Hsu has worked with notable companies in the industry, including Entegris, Inc. and Corum Inc. His expertise in etching compositions has positioned him as a valuable asset in the microelectronics sector.

Collaborations

Hsu has collaborated with several professionals in his field, including Chieh Ju Wang and Emanuel Israel Cooper. These collaborations have contributed to the advancement of technologies in microelectronics.

Conclusion

Chia-Jung Hsu's innovative work in etching compositions has made a significant impact on the microelectronics industry. His contributions continue to influence the development of advanced semiconductor manufacturing techniques.