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For the Inventor, By the Inventor

Hsinchu, Taiwan

Chia-Hao Tai

This inventor holds 5 USPTO granted patents and 2 published patent applications. Top assignee: Yield Microelectronics Corp.. Active years: 2012-2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chia-Hao Tai. Retrieved from https://idiyas.com/inventor/chia-hao-tai

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 5 

% Patents Active = 100.0

Average Co-Inventor Count = 4.4

ph-index = 1

Forward Citations = 9(Granted Patents)


Location History:

  • Hsinchu County, TW (2012 - 2017)
  • Chu-Pei, TW (2019)

Company Filing History:

goldMedal5 out of 28 
 
Yield Microelectronics Corp.
 patents

Years Active: 2012-2019

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5 patents (USPTO):Explore Patents
1. 10242741 - Low voltage difference operated EEPROM and operating method thereof (2019-03-26),
2. 9601202 - Low voltage difference operated EEPROM and operating method thereof (2017-03-21),
3. 8305808 - Low-voltage EEPROM array (2012-11-06),
4. 8300469 - Cost saving electrically-erasable-programmable read-only memory (EEPROM) array (2012-10-30),
5. 8300461 - Area saving electrically-erasable-programmable read-only memory (EEPROM) array (2012-10-30),

Title: Innovations of Chia-Hao Tai in EEPROM Technology

Introduction

Chia-Hao Tai is a prominent inventor based in Hsinchu County, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the development of EEPROM (Electrically Erasable Programmable Read-Only Memory) devices. With a total of five patents to his name, Tai's work focuses on enhancing the efficiency and performance of memory storage solutions.

Latest Patents

Chia-Hao Tai's latest patents include innovative designs for low voltage difference-operated EEPROMs. One of his notable inventions discloses a low voltage difference-operated EEPROM and an operating method that involves forming at least one transistor structure in a semiconductor substrate. This design includes a first electric-conduction gate and utilizes ion implantation techniques to optimize the device's performance. By preventing the existence of the conventional lightly doped drain (LDD) structure, Tai's invention increases the intensity of the electric field, thereby reducing the voltage differences required for writing and erasing data. Another patent further explores the same concept, focusing on increasing ion concentration in regions near the interfaces of the source, drain, and the first electric-conduction gate.

Career Highlights

Chia-Hao Tai is currently employed at Yield Microelectronics Corporation, where he continues to innovate in the field of semiconductor technology. His work has been instrumental in advancing the capabilities of EEPROM devices, making them more efficient and reliable for various applications.

Collaborations

Throughout his career, Tai has collaborated with notable colleagues, including Ya-Ting Fan and Hsin Chang Lin. These partnerships have contributed to the successful development of his patented technologies.

Conclusion

Chia-Hao Tai's contributions to EEPROM technology exemplify his commitment to innovation in the semiconductor industry. His patents reflect a deep understanding of electrical engineering principles and a drive to enhance memory storage solutions.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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