Chi-Yuan Sun

Title: The Innovative Contributions of Chi-Yuan Sun

Introduction

Chi-Yuan Sun is a prominent inventor based in Yunlin County, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 6 patents. His work primarily focuses on manufacturing methods for metal gate structures, which are crucial in the development of advanced electronic devices.

Latest Patents

Chi-Yuan Sun's latest patents include a manufacturing method of a metal gate structure. This method involves several steps, starting with providing a substrate covered by an interlayer dielectric. A gate trench is then formed in the interlayer dielectric, where a gate dielectric layer is created. Following this, a silicon-containing work function layer is formed on the gate dielectric layer within the gate trench. This layer consists of both a vertical portion and a horizontal portion. Finally, the gate trench is filled with a conductive metal layer. Another notable patent is the structure of a metal gate structure and its manufacturing method, which follows a similar process to the aforementioned patent.

Career Highlights

Chi-Yuan Sun is currently employed at United Microelectronics Corporation, a leading company in the semiconductor industry. His expertise in manufacturing methods has positioned him as a valuable asset to the organization. His innovative approaches have contributed to advancements in semiconductor technology, enhancing the performance and efficiency of electronic devices.

Collaborations

Chi-Yuan has collaborated with notable coworkers, including Min-Chuan Tsai and Hsin-Fu Huang. Their combined efforts in research and development have led to significant advancements in their field.

Conclusion

Chi-Yuan Sun's contributions to semiconductor technology through his innovative patents and collaborations highlight his importance in the industry. His work continues to influence the development of advanced electronic devices, showcasing the impact of his inventions.