Veradale, WA, United States of America

Chi Tse Wu

USPTO Granted Patents = 8 

Average Co-Inventor Count = 4.7

ph-index = 6

Forward Citations = 73(Granted Patents)


Company Filing History:


Years Active: 2000-2010

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8 patents (USPTO):Explore Patents

Title: Chi Tse Wu: A Pioneer in Copper Sputtering Technology

Introduction

Chi Tse Wu, an inventive mind based in Veradale, Washington, has made significant contributions to the field of materials science, particularly in the development of copper sputtering targets. With a portfolio of eight patents, his work demonstrates a commitment to advancing technology that has important implications in various industries.

Latest Patents

Wu's latest innovations include groundbreaking patents on copper sputtering targets and methods for their formation. One notable patent details a copper-comprising sputtering target that is monolithic or bonded, containing at least 99.99% copper by weight. This target boasts an average grain size ranging from 1 micron to 50 microns, with a yield strength exceeding approximately 15 ksi and a Brinell hardness (HB) of greater than about 40. In addition, Wu has developed copper alloy targets that also maintain high purity levels while introducing alloying elements in controlled amounts. Another important patent discusses a novel construction for physical vapor deposition targets, which includes a sputtering region and a flange region designed to enhance efficiency and durability during use.

Career Highlights

Throughout his career, Chi Tse Wu has worked with reputable companies, including Honeywell International Inc. and Johnson Matthey Electronics, Inc. His industry experience has provided him with unique insights that are reflected in his innovative patent designs, which aim to solve pressing challenges in the manufacturing and materials sectors.

Collaborations

Wu has collaborated with an impressive pool of colleagues, such as Janine K. Kardokus and Christopher L. Parfeniuk. These collaborations have likely fostered a rich exchange of ideas, further enhancing the innovative quality of his inventions and contributing to advancements in their respective fields.

Conclusion

Chi Tse Wu stands out as a notable inventor, whose contributions to copper sputtering technology underscore the significance of innovation in material sciences. His patents are not only a testament to his creativity but also play a crucial role in redefining standards in manufacturing practices. As industry needs evolve, inventors like Wu will continue to pave the way for future advancements.

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