Hsinchu Hsien, Taiwan

Chewnpu Jou


Average Co-Inventor Count = 1.3

ph-index = 5

Forward Citations = 81(Granted Patents)


Company Filing History:


Years Active: 2001-2003

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7 patents (USPTO):Explore Patents

Title: Chewnpu Jou: Innovator in MOS Capacitor Technology

Introduction

Chewnpu Jou is a prominent inventor based in Hsinchu Hsien, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the fabrication of MOS capacitors. With a total of 7 patents to his name, Jou continues to push the boundaries of innovation in his field.

Latest Patents

One of Jou's latest patents is a method of fabricating a MOS capacitor in a complementary MOS fabrication process with dual-doped poly gates. This method involves providing a substrate of a first conductive type, which includes a first well of the same type and a second well of a different conductive type. A dielectric layer is formed on the substrate, followed by the creation of a first poly gate of the first conductive type over the first well and a second poly gate of the second conductive type over the second well. Doped regions are formed in the substrate at each side of the poly gates, and spacers are created on their sidewalls. The process includes implantations to form substrate electrodes, showcasing Jou's innovative approach to semiconductor fabrication.

Career Highlights

Chewnpu Jou is currently employed at United Microelectronics Corporation, a leading company in the semiconductor industry. His work has been instrumental in advancing the technology behind MOS capacitors, making him a key figure in his field.

Collaborations

Jou has collaborated with notable colleagues, including David Lee and Roger Yen. Their combined expertise has contributed to the successful development of innovative technologies in semiconductor fabrication.

Conclusion

Chewnpu Jou's contributions to the field of semiconductor technology, particularly through his patents and collaborations, highlight his role as an influential inventor. His work continues to impact the industry and inspire future innovations.

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