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For the Inventor, By the Inventor

Singapore, Singapore

Chew-Hoe Ang

USPTO Granted Patents = 9

Average Co-Inventor Count = 5.2

ph-index = 6

Forward Citations = 137(Granted Patents)


Company Filing History:

goldMedal9 out of 962 
 
Chartered Semiconductor Manufacturing Ltd (corporation)
 patents

Years Active: 2002-2006

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9 patents (USPTO):
1. 7132878 - Charge pump current source (2006-11-07),
2. 6828082 - Method to pattern small features by using a re-flowable hard mask (2004-12-07),
3. 6709912 - Dual Si-Ge polysilicon gate with different Ge concentrations for CMOS device optimization (2004-03-23),
4. 6632712 - Method of fabricating variable length vertical transistors (2003-10-14),
5. 6610604 - Method of forming small transistor gates by using self-aligned reverse spacer as a hard mask (2003-08-26),
6. 6610575 - Forming dual gate oxide thickness on vertical transistors by ion implantation (2003-08-26),
7. 6605501 - Method of fabricating CMOS device with dual gate electrode (2003-08-12),
8. 6468851 - Method of fabricating CMOS device with dual gate electrode (2002-10-22),
9. 6403425 - Dual gate oxide process with reduced thermal distribution of thin-gate channel implant profiles due to thick-gate oxide (2002-06-11),

Title: Chew-Hoe Ang: Innovator in Semiconductor Technology

Introduction

Chew-Hoe Ang is a prominent inventor based in Singapore, known for his significant contributions to semiconductor technology. With a total of nine patents to his name, he has made remarkable advancements in the field, particularly in current source generation and feature patterning.

Latest Patents

One of his latest inventions is the "Charge pump current source." This invention provides a circuit and a method for generating a low-level current using semiconductor charge pumping. It allows for the generation of a range of current sources by varying the frequency of a repetitive voltage pulse input signal. Additionally, this invention utilizes one or many MOSFET devices to produce higher levels of current. The current source embodiments generate very stable current sources with high input impedances.

Another notable patent is the "Method to pattern small features by using a re-flowable hard mask." This method involves several steps, starting with a substrate having a dielectric layer formed over it. A spacing layer is created over the dielectric layer, with a thickness equal to that of the small feature to be formed. A patterned, re-flowable masking layer is then formed over the spacing layer, which is subsequently re-flowed to create a patterned, re-flowed masking layer. This process allows for the formation of small features with precision, as the spacing layer is etched down to the dielectric layer using the patterned, re-flowed masking layer as a mask.

Career Highlights

Chew-Hoe Ang has had a distinguished career at Chartered Semiconductor Manufacturing Ltd, where he has played a crucial role in advancing semiconductor technologies. His innovative work has not only contributed to the company’s success but has also had a lasting impact on the industry.

Collaborations

Throughout his career, Chew-Hoe Ang has collaborated with talented individuals such as Jia-Zhen Zheng and Elgin Kiok Quek. These collaborations have fostered an environment of innovation and creativity, leading to the development of groundbreaking technologies.

Conclusion

Chew-Hoe Ang's contributions to semiconductor technology through his patents and collaborations highlight his status as a leading inventor in the field. His work continues to influence advancements in technology and innovation.

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