Cherng-Chang Tsuei

Title: Cherng-Chang Tsuei: Innovator in Semiconductor Technology

Introduction

Cherng-Chang Tsuei is a prominent inventor based in Hsin-Chu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 10 patents. His work focuses on advanced process control methods and semiconductor structures, which are crucial for the development of modern electronic devices.

Latest Patents

One of his latest patents is an "Advanced process control method for controlling width of spacer and dummy sidewall in semiconductor device." This innovative method involves providing a semiconductor substrate and a target width for a gate. It includes forming the gate on the substrate, depositing a dielectric layer, and determining a trim time for the dielectric layer to form the spacer effectively.

Another notable patent is the "Semiconductor structure and manufacturing method thereof." This patent describes a semiconductor structure that includes a substrate and a metal gate, featuring a metallic filling layer and a dielectric material. The structure is designed to enhance the performance and reliability of semiconductor devices.

Career Highlights

Cherng-Chang Tsuei is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His expertise and innovative approaches have significantly impacted the company's advancements in semiconductor manufacturing.

Collaborations

Throughout his career, Tsuei has collaborated with notable colleagues, including Han-Wen Liao and Chih-Yu Lin. These collaborations have fostered a productive environment for innovation and development in semiconductor technologies.

Conclusion

Cherng-Chang Tsuei is a key figure in the semiconductor industry, with a strong portfolio of patents that reflect his innovative spirit and technical expertise. His contributions continue to shape the future of semiconductor technology.