Location History:
- Nirasaki, JP (2016 - 2019)
- Yamanashi, JP (2019)
Company Filing History:
Years Active: 2016-2019
Title: Cheonsoo Han: Innovator in Ruthenium Wiring and Plasma Film-Forming Technologies
Introduction
Cheonsoo Han is a prominent inventor based in Nirasaki, Japan. He has made significant contributions to the field of materials science, particularly in the development of advanced wiring and film-forming technologies. With a total of four patents to his name, Han's work is recognized for its innovative approaches and practical applications.
Latest Patents
Han's latest patents include a method for creating ruthenium wiring. This invention features a TiON film that serves as a base film in a recess formed in a substrate's surface. A ruthenium film is then deposited on the TiON film to fill the recess, enhancing the performance of electronic components. Another notable patent is a plasma film-forming method and apparatus. This method involves accommodating a workpiece in a chamber, supplying a film-forming gas, and generating plasma to excite the gas, resulting in a predetermined film on the workpiece. The inclusion of helium gas as a plasma-generating agent further optimizes the process.
Career Highlights
Cheonsoo Han is currently employed at Tokyo Electron Limited, a leading company in the semiconductor and electronics manufacturing industry. His work at the company has allowed him to push the boundaries of technology and contribute to advancements in electronic materials.
Collaborations
Han has collaborated with notable colleagues, including Tadahiro Ishizaka and Toshiaki Fujisato. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.
Conclusion
Cheonsoo Han's contributions to the fields of ruthenium wiring and plasma film-forming technologies highlight his role as a key innovator in the industry. His patents reflect a commitment to advancing technology and improving manufacturing processes.