Company Filing History:
Years Active: 1999-2015
Title: Chen-Chiu Hsu: Innovator in Semiconductor Technology
Introduction
Chen-Chiu Hsu is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of four patents. His work focuses on methods for forming semiconductor structures, which are crucial for the advancement of electronic devices.
Latest Patents
One of Chen-Chiu Hsu's latest patents is a method of forming a semiconductor structure. This method involves providing a substrate with a cell area and a periphery area. A stacked structure, which includes a gate oxide layer, a floating gate, and a first spacer, is formed on the substrate in the cell area. Additionally, a resistor is formed on the substrate in the periphery area. The process includes forming at least two doped regions in the substrate beside the stacked structure. A dielectric material layer and a conductive material layer are sequentially formed on the substrate. A patterned photoresist layer is then created to cover the stacked structure and a portion of the resistor. The layers not covered by the patterned photoresist are removed, resulting in an inter-gate dielectric layer and a control gate on the stacked structure, while simultaneously forming a salicide block layer on the resistor.
Career Highlights
Throughout his career, Chen-Chiu Hsu has worked with notable companies in the semiconductor industry, including Maxchip Electronics Corporation and United Microelectronics Corporation. His experience in these organizations has allowed him to refine his skills and contribute to innovative projects in semiconductor technology.
Collaborations
Chen-Chiu Hsu has collaborated with esteemed colleagues such as Tung-Ming Lai and Kai-An Hsueh. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.
Conclusion
Chen-Chiu Hsu is a distinguished inventor whose work in semiconductor technology has led to significant advancements in the field. His patents and collaborations reflect his commitment to innovation and excellence in technology.
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