This inventor holds 35 USPTO granted patents and 3 published patent applications and 7 EPO patents, primarily in Photoresist Compositions. Top assignees: Shipley Company LLC, Rohm & Haas Electronic Materials LLC, University of California. Active years: 1993-2015.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- St. Louis, MO (US) (1993)
- Marlborough, MA (US) (2007)
- Los Angeles, CA (US) (2009)
- Westborough, MA (US) (1995 - 2015)
Company Filing History:
23 out of 522 
8 out of 696 
2 out of 16,008 
Years Active: 1993-2015
Areas of Expertise:
Title: The Innovative Contributions of Charles R. Szmanda
Introduction
Charles R. Szmanda, based in Westborough, MA, is a prolific inventor with a significant portfolio of 33 patents. His work primarily focuses on advancements in materials and processes crucial to the field of photolithography and semiconductor manufacturing. His innovative approaches have proven vital in improving the efficiency and effectiveness of various applications in the electronics industry.
Latest Patents
Among his most recent patents, Szmanda has developed new photoresist compositions that enhance immersion lithography techniques. These compositions, which include one or more block copolymers, offer reduced leaching of resist materials when in contact with immersion fluids during processing. This advancement is critical to improving the quality and usability of photolithographic methods.
Another notable patent involves the creation of a selenium/Group 1B ink. This ink's formulation includes a selenium component, organic chalcogenides, and a Group 1B component, all suspended in a liquid carrier. The innovative method allows for the stable dispersion of the ink, which is fundamental for various applications in electronics manufacturing.
Career Highlights
Charles Szmanda has built his career at reputable companies, including Shipley Company and Rohm & Haas Electronic Materials LLC. His tenure at these organizations has significantly impacted the advancement of materials used in photolithography and semiconductor processing. Szmanda's commitment to innovation and excellence has made him a respected figure in his field.
Collaborations
Throughout his career, Szmanda has collaborated with industry experts, including notable coworkers like Peter Trefonas, III, and Gary N. Taylor. These collaborations have fostered an environment of shared knowledge and innovation, leading to numerous developments in the field of semiconductor materials and photoresist chemistry.
Conclusion
Charles R. Szmanda's contributions to innovation in the semiconductor industry are exemplified by his extensive portfolio of patents and collaborative efforts. His ingenuity in developing advanced materials, particularly in photolithography, continues to influence the industry and inspire future innovations. As technology evolves, inventors like Szmanda play a crucial role in driving progress and exploring new possibilities in materials science.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile