Shipley Company LLC

Rohm & Haas Electronic Materials LLC

University of California

Other

Rohm and Haas Company

Rohm and Haas Electronics Materials LLC

Charles R Szmanda

Peter Trefonas, Iii

Gary N Taylor

George G Barclay

David Wayne Mosley

Kevin Calzia

Anthony Zampini

Lujia Bu

Richard J Carey

Wang Yueh

David L Thorsen

Kathleen B Spear-Alfonso

Yang Yang

Jianyong Ouyang

James F Cameron

James W Thackeray

Cheng-Bai Xu

Deyan Wang

Roger F Sinta

Leonard Edward Bogan, Jr

Gerhard Pohlers

Kathleen M O'Connell

Manuel doCanto

Gerald B Wayton

Edward Greer

Alan Isami Nakatani

David C Madoux

Robert L Brainard

Uday Kumar

Richard C Hemond

Leo L Linehan

Gerald C Vizvary

Georg R Kestler

Brian P McDavitt

Mark S Thirsk

James R Shelnut

Edward C Greer

New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprise one or more block copolymers. Particularly preferred photoresists of the invention can exhibit reduced leaching of resist materials into an immersion fluid contacting the resist layer dining immersion lithography processing.

Compositions comprising carboxy component and processes for photolithography

A method for preparing a Group 1a-1b-3a-6a material using a selenium/Group 1b ink comprising, as initial components: a selenium component comprising selenium, an organic chalcogenide component having a formula selected from RZ&#x2014;Z'R&#x2032; and R&#x2014;SH, a Group 1b component and a liquid carrier; wherein Z and Z&#x2032; are each independently selected from sulfur, selenium and tellurium; wherein R is selected from H, Calkyl group, a Caryl group, a Calkylhydroxy group, an arylether group and an alkylether group; wherein R&#x2032; and Rare selected from a Calkyl group, a Caryl group, a Calkylhydroxy group, an arylether group and an alkylether group; and wherein the selenium/Group 1b ink is a stable dispersion.

Selenium/group 1B ink and methods of making and using same

A method for preparing a Group 1a-1b-3a-6a material using a selenium ink comprising a chemical compound having a formula RZ&#x2014;Se&#x2014;Z'R&#x2032; stably dispersed in a liquid carrier is provided, wherein the selenium ink is hydrazine free and hydrazinium free.

Dichalcogenide selenium ink and methods of making and using same

A selenium ink comprising a chemical compound having a formula RZ&#x2014;Se&#x2014;Z'R&#x2032; stably dispersed in a liquid carrier is provided, wherein the selenium ink is hydrazine free and hydrazinium free. Also provided are methods of preparing the selenium ink and of using the selenium ink to deposit selenium on a substrate for use in the manufacture of a variety of chalcogenide containing semiconductor materials, such as, thin film transistors (TFTs), light emitting diodes (LEDs); and photoresponsive devices (e.g., electrophotography (e.g., laser printers and copiers), rectifiers, photographic exposure meters and photovoltaic cells) and chalcogenide containing phase change memory materials.

A selenium/Group 1b ink comprising, as initial components: a selenium component comprising selenium, an organic chalcogenide component having a formula selected from RZ&#x2014;Z'R&#x2032; and R&#x2014;SH, a Group 1b component and a liquid carrier; wherein Z and Z&#x2032; are each independently selected from sulfur, selenium and tellurium; wherein R is selected from H, Calkyl group, a Caryl group, a Calkylhydroxy group, an arylether group and an alkylether group; wherein R&#x2032; and Rare selected from a Calkyl group, a Caryl group, a Calkylhydroxy group, an arylether group and an alkylether group; and wherein the selenium/Group 1b ink is a stable dispersion. Also provided are methods of preparing the selenium/Group 1b ink and of using the selenium/Group 1b ink to deposit selenium and a Group 1b material on a substrate (preferably to deposit a MSematerial on a substrate for use in the manufacture of photovoltaic cells; wherein the mole ratio of M to selenium in the MSematerial deposited is tailorable; wherein M is at least one of copper and silver).

Selenium/group 1b ink and methods of making and using same

A selenium/Group 3ink, comprising (a) a selenium/Group 3complex which comprises a combination of, as initial components: a selenium component comprising selenium; an organic chalcogenide component having a formula selected from RZ&#x2014;Z'R&#x2032; and R&#x2014;SH; wherein Z and Z&#x2032; are each independently selected from sulfur, selenium and tellurium; wherein R is selected from H, Calkyl group, a Caryl group, a Chydroxyalkyl group, an arylether group and an alkylether group; wherein R&#x2032; and Rare selected from a Calkyl group, a Caryl group, a Chydroxyalkyl group, an arylether group and an alkylether group; and, a Group 3complex, comprising at least one Group 3material selected from aluminum, indium, gallium and thallium complexed with a multidentate ligand; and, (b) a liquid carrier; wherein the selenium/Group 3complex is stably dispersed in the liquid carrier.

Group 6a/group 3a ink and methods of making and using same

Curable compositions are disclosed. Also disclosed are optical media comprising said curable compositions when cured and methods of making such optical media.

Curable compositions

Underlying coating compositions are provided for use with an overcoated photoresist composition. In one aspect, the coating composition can be crosslinked and comprise one or more components that contain one or more acid-labile groups and/or one or more base-reactive groups that are reactive following crosslinking. In another aspect, underlying coating composition are provided that can be treated to provide a modulated water contact angle. Preferred coating compositions can enhance lithographic performance of an associated photoresist composition.

Coating compositions for use with an overcoated photoresist

A composition for the formation of an electric field programmable film, the composition comprising a matrix precursor composition or a dielectric matrix material, wherein the dielectric matrix material comprises an organic polymer and/or a inorganic oxide; and an electron donor and an electron acceptor of a type and in an amount effective to provide electric field programming. The films are of utility in data storage devices.

Memory devices based on electric field programmable films

A substituted (meth)acrylic copolymer leveling agent is useful in producing a ferroelectric polymer film that is especially suitable for use in a data processing device. Also disclosed is a a casting composition which includes the leveling agent, a film stack, and a data processing device comprising a ferroelectric film produced using the leveling agent.

Leveling agents for cast ferroelectric polymer films

Disclosed herein is a process of forming a ferroelectric polymer film from a solution, wherein the solvent composition is selected so as to adjust the properties of the film. Films formed by this method have improved properties, particularly with respect to roughness and crystal domain size.

Process for selecting solvents for forming films of ferroelectric polymers

This invention relates to resins and photoresist compositions that comprise such resins. Preferred polymers of the invention comprise adjacent saturated carbon atoms, either integral or pendant to the polymer backbone, that have a substantially gauche conformation. Polymers of the invention are particularly useful as a resin binder component of chemically-amplified positive-acting resists that can be effectively imaged at short wavelengths such as sub-200 nm and preferably about 157 nm. In such short-wavelength imaging applications, polymers of the invention that have a population of dihedral angles of adjacent saturated carbon atoms that are enriched in substantially gauche conformations can provide reduced undesired absorbance of the high energy exposure radiation.

Polymers and photoresist compositions for short wavelength imaging

Disclosed are spirocyclic olefin polymers, methods of preparing spirocyclic olefin polymers, photresist compositions including spirocyclic olefin resin binders and methods of forming relief images using such photoresist compositions.

Polymer and photoresist compositions

A method and system is provided for improving the efficiency of a process for manufacturing a product and begins with the step of receiving from a manufacturer a desire to manufacture a number of said products. Next, the amount of materials that is required to produce the number of products is determined. Next, the optimum process for manufacturing the number of products is determined. Next, a cost to manufacture the number of products based on the amount of materials and the optimum process is calculated. The manufacturer is then provided with the optimum process and the cost to manufacture the number of products. Finally, a payment is received from the manufacturer that is proportional to the cost to manufacture the number of products.

Manufacturing process billing system

Growing community of inventors

Westborough, MA, United States of America

Charles R Szmanda