Charles C Garretson

Title: Charles C. Garretson: Innovator in Substrate Polishing Technology

Introduction: Charles C. Garretson, a prominent inventor located in Sunnyvale, CA, holds an impressive portfolio of 36 patents. His innovative contributions primarily focus on technologies that enhance substrate polishing, showcasing his expertise and commitment to advancing manufacturing processes.

Latest Patents: Among Garretson's most recent inventions, two patents stand out for their technological sophistication. The first patent introduces a polishing head featuring local wafer pressure, which includes a carriage arm equipped with an actuator that effectively manages pressure between a substrate and a polishing pad. The actuator's design utilizes a piston and roller system for precise control, allowing enhanced performance during substrate polishing.

The second patent revolves around the control of processing parameters in substrate polishing using angularly distributed zones. This invention outlines a method for generating a recipe that defines polishing rates based on pressures for various zones on the carrier head. By minimizing the discrepancies between the expected and target thickness profiles, Garretson's innovation promises to optimize the polishing process and improve overall efficiency.

Career Highlights: Charles C. Garretson currently works at Applied Materials, Inc., a leading company in the semiconductor manufacturing sector. His role involves the application of his patentable ideas to improve the quality and performance of substrate polishing systems. With his deep understanding of the intricacies of chemical mechanical polishing (CMP) and extensive experience in the field, Garretson has established himself as a vital asset to his company.

Collaborations: Throughout his career, Garretson has collaborated with talented individuals, including Jeonghoon Oh and Steven M. Zuniga. These partnerships have fostered a dynamic environment for innovation, enabling them to tackle complex challenges in substrate processing together. Their collaborative efforts have led to notable advancements in polishing technologies, which benefit the semiconductor industry.

Conclusion: Charles C. Garretson's contributions to the realm of substrate polishing technology through his 36 patents underscore his role as a leading inventor in this field. With a focus on improving the accuracy and efficiency of polishing processes, his work continues to have a significant impact on semiconductor manufacturing, paving the way for further innovations and advancements in the industry.