The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 02, 2022

Filed:

Oct. 02, 2018
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Jeonghoon Oh, Saratoga, CA (US);

Charles C. Garretson, Sunnyvale, CA (US);

Eric Lau, Santa Clara, CA (US);

Andrew Nagengast, Sunnyvale, CA (US);

Steven M. Zuniga, Soquel, CA (US);

Edwin C. Suarez, Fremont, CA (US);

Huanbo Zhang, San Jose, CA (US);

Brian J. Brown, Palo Alto, CA (US);

Assignee:

APPLIED MATERIALS, INC., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B24B 47/02 (2006.01); B24B 37/32 (2012.01); H01L 21/687 (2006.01);
U.S. Cl.
CPC ...
B24B 37/32 (2013.01); H01L 21/687 (2013.01);
Abstract

Embodiments herein relate to a retaining ring for use in a polishing process. The retaining ring includes an annular body having an upper surface and a lower surface. An inner surface is connected to the upper surface and the lower surface. The inner surface includes one or more surfaces that are used to retain a substrate during processing. The one or more surfaces have an angle relative to a central axis of the retaining ring. The inner surface also includes a plurality of facets. Channels are disposed within the retaining ring to allow passage of a polishing fluid from an inner surface to an outer surface of the retaining ring disposed opposite of the inner surface.


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