Changzhou Wang

Title: Changzhou Wang: Innovator in Capacitor and Memory Technologies

Introduction

Changzhou Wang is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of semiconductor technology, particularly in capacitor structures and memory devices. With a total of 2 patents, his work has advanced the understanding and manufacturing processes of electronic components.

Latest Patents

Changzhou Wang's latest patents include innovative designs and methods that enhance the performance of capacitors and resistive random access memory (RRAM). The first patent, titled "Capacitor structure and forming method thereof," describes a capacitor structure that features a substrate and a bottom electrode composite layer. This composite layer consists of a first electrode layer and a second electrode layer, where the second layer has a lower oxidation rate than the first. This design aims to improve the reliability and efficiency of capacitors.

The second patent, "Semiconductor random access memory and manufacturing method thereof," outlines a method for manufacturing RRAM. This method involves creating a bottom interconnection layer and a bottom dielectric layer, which includes a via that exposes part of the interconnection layer. A bottom electrode layer is then formed in the via, enhancing the filling capability of the electrode layer. These innovations are crucial for the development of more efficient memory devices.

Career Highlights

Throughout his career, Changzhou Wang has worked with notable companies in the semiconductor industry. He has been associated with Semiconductor Manufacturing International Corporation in Shanghai and Semiconductor Manufacturing International Corporation in Beijing. His experience in these organizations has allowed him to refine his skills and contribute to cutting-edge technologies in the field.

Collaborations

Changzhou Wang has collaborated with various professionals in the industry, including his coworker Jiquan Liu. These collaborations have fostered an environment of innovation and have led to the development of advanced technologies in semiconductor manufacturing.

Conclusion

Changzhou Wang's contributions to capacitor and memory technologies highlight his role as a key innovator in the semiconductor industry. His patents reflect a commitment to enhancing electronic components, paving the way for future advancements in technology.