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For the Inventor, By the Inventor

San Jose, CA, United States of America

Changhun Lee

LinkedIn
USPTO Granted Patents = 15 

Average Co-Inventor Count = 4.0

ph-index = 3

Forward Citations = 57(Granted Patents)


Company Filing History:

goldMedal15 out of 13,684 
 
Applied Materials, Inc.
 patents

Years Active: 2010-2024

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15 patents (USPTO):Explore Patents
1. 12009236 - Sensors and system for in-situ edge ring erosion monitor (2024-06-11),
2. 11955318 - Ash rate recovery method in plasma strip chamber (2024-04-09),
3. 11488812 - Method and apparatus for reducing particle defects in plasma etch chambers (2022-11-01),
4. D931240 - Substrate support pedestal (2021-09-21),
5. 11094511 - Processing chamber with substrate edge enhancement processing (2021-08-17),
6. 11088000 - Wafer based corrosion and time dependent chemical effects (2021-08-10),
7. 10658161 - Method and apparatus for reducing particle defects in plasma etch chambers (2020-05-19),
8. 10515862 - Wafer based corrosion and time dependent chemical effects (2019-12-24),
9. 10217627 - Methods of non-destructive post tungsten etch residue removal (2019-02-26),
10. 9885567 - Substrate placement detection in semiconductor equipment using thermal response characteristics (2018-02-06),
11. 9155184 - Plasma generation source employing dielectric conduit assemblies having removable interfaces and related assemblies and methods (2015-10-06),
12. 8771423 - Low sloped edge ring for plasma processing chamber (2014-07-08),
13. 8287650 - Low sloped edge ring for plasma processing chamber (2012-10-16),
14. 8101025 - Method for controlling corrosion of a substrate (2012-01-24),
15. 7807579 - Hydrogen ashing enhanced with water vapor and diluent gas (2010-10-05),

Title: Innovations of Changhun Lee in Plasma Processing Technology

Introduction

Changhun Lee is a prominent inventor based in San Jose, California, known for his significant contributions to the field of plasma processing technology. With a total of 15 patents to his name, Lee has developed innovative solutions that enhance the efficiency and effectiveness of plasma processing chambers.

Latest Patents

Among his latest patents is the invention titled "Sensors and system for in-situ edge ring erosion monitor." This patent describes a method and apparatus designed to determine metrics related to the erosion of a ring assembly used in etching processes within plasma processing chambers. The apparatus is configured to obtain metrics indicative of erosion on an edge ring disposed on a substrate support assembly. A sensor is employed to gather this metric, which correlates to the quantity of erosion in the edge ring. Another notable patent is the "Ash rate recovery method in plasma strip chamber." This method outlines a process for recovering the ashing rate in a plasma processing chamber by evaporating silicon chloride residue from a substrate and converting it into a silicon oxide passivation layer.

Career Highlights

Changhun Lee is currently employed at Applied Materials, Inc., a leading company in the semiconductor and display industries. His work focuses on advancing technologies that improve plasma processing techniques, which are critical for the manufacturing of electronic devices.

Collaborations

Lee has collaborated with notable colleagues, including Michael D. Willwerth and Leonard Michael Tedeschi, contributing to various projects that push the boundaries of plasma processing technology.

Conclusion

Changhun Lee's innovative patents and contributions to plasma processing technology underscore his role as a leading inventor in the field. His work continues to influence advancements in semiconductor manufacturing and related industries.

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