Growing community of inventors

San Jose, CA, United States of America

Changhun Lee

Average Co-Inventor Count = 3.99

ph-index = 3

The patent ph-index is calculated by counting the number of publications for which an author has been cited by other authors at least that same number of times.

Forward Citations = 57

Changhun LeeMichael D Willwerth (5 patents)Changhun LeeLeonard Michael Tedeschi (3 patents)Changhun LeeAndrew Nguyen (2 patents)Changhun LeeXikun Wang (2 patents)Changhun LeeMeihua Shen (2 patents)Changhun LeeBenjamin Schwarz (2 patents)Changhun LeePing Han Hsieh (2 patents)Changhun LeeDaniel Thomas McCormick (2 patents)Changhun LeeAdauto Diaz, Jr (2 patents)Changhun LeeXiaoming He (2 patents)Changhun LeeYi Zhou (2 patents)Changhun LeeRajinder Dhindsa (1 patent)Changhun LeePhilip Allan Kraus (1 patent)Changhun LeeGuowen Ding (1 patent)Changhun LeeValentin Nikolov Todorow (1 patent)Changhun LeeJared Ahmad Lee (1 patent)Changhun LeeMartin Jeffrey Salinas (1 patent)Changhun LeeMark Naoshi Kawaguchi (1 patent)Changhun LeePhillip A Criminale (1 patent)Changhun LeeAndreas Schmid (1 patent)Changhun LeeYaoling Pan (1 patent)Changhun LeeDenis M Koosau (1 patent)Changhun LeePatrick John Tae (1 patent)Changhun LeeDaniel Sang Byun (1 patent)Changhun LeeDanny Chien Lu (1 patent)Changhun LeeHun Sang Kim (1 patent)Changhun LeeKyeong-Tae Lee (1 patent)Changhun LeeJeffrey Ludwig (1 patent)Changhun LeeRoberto Cesar Cotlear (1 patent)Changhun LeeEu Jin Lim (1 patent)Changhun LeeChan-Syun Yang (1 patent)Changhun LeeHoan Hai Nguyen (1 patent)Changhun LeeHuutri Dao (1 patent)Changhun LeeHean Cheal Lee (1 patent)Changhun LeeYongkwan Kim (1 patent)Changhun LeeChung Hoan Kim (1 patent)Changhun LeeYoungmin Shin (1 patent)Changhun LeeSiu Tang Ng (1 patent)Changhun LeeHoan Hguyen (1 patent)Changhun LeeChungdee Pong (1 patent)Changhun LeeChanghun Lee (15 patents)Michael D WillwerthMichael D Willwerth (52 patents)Leonard Michael TedeschiLeonard Michael Tedeschi (25 patents)Andrew NguyenAndrew Nguyen (179 patents)Xikun WangXikun Wang (50 patents)Meihua ShenMeihua Shen (43 patents)Benjamin SchwarzBenjamin Schwarz (22 patents)Ping Han HsiehPing Han Hsieh (9 patents)Daniel Thomas McCormickDaniel Thomas McCormick (9 patents)Adauto Diaz, JrAdauto Diaz, Jr (5 patents)Xiaoming HeXiaoming He (5 patents)Yi ZhouYi Zhou (5 patents)Rajinder DhindsaRajinder Dhindsa (199 patents)Philip Allan KrausPhilip Allan Kraus (113 patents)Guowen DingGuowen Ding (74 patents)Valentin Nikolov TodorowValentin Nikolov Todorow (60 patents)Jared Ahmad LeeJared Ahmad Lee (37 patents)Martin Jeffrey SalinasMartin Jeffrey Salinas (35 patents)Mark Naoshi KawaguchiMark Naoshi Kawaguchi (28 patents)Phillip A CriminalePhillip A Criminale (26 patents)Andreas SchmidAndreas Schmid (23 patents)Yaoling PanYaoling Pan (21 patents)Denis M KoosauDenis M Koosau (21 patents)Patrick John TaePatrick John Tae (19 patents)Daniel Sang ByunDaniel Sang Byun (14 patents)Danny Chien LuDanny Chien Lu (10 patents)Hun Sang KimHun Sang Kim (8 patents)Kyeong-Tae LeeKyeong-Tae Lee (7 patents)Jeffrey LudwigJeffrey Ludwig (6 patents)Roberto Cesar CotlearRoberto Cesar Cotlear (5 patents)Eu Jin LimEu Jin Lim (4 patents)Chan-Syun YangChan-Syun Yang (2 patents)Hoan Hai NguyenHoan Hai Nguyen (2 patents)Huutri DaoHuutri Dao (2 patents)Hean Cheal LeeHean Cheal Lee (1 patent)Yongkwan KimYongkwan Kim (1 patent)Chung Hoan KimChung Hoan Kim (1 patent)Youngmin ShinYoungmin Shin (1 patent)Siu Tang NgSiu Tang Ng (1 patent)Hoan HguyenHoan Hguyen (1 patent)Chungdee PongChungdee Pong (1 patent)
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Inventor’s number of patents
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Strength of working relationships

Company Filing History:

1. Applied Materials, Inc. (15 from 13,684 patents)


15 patents:

1. 12009236 - Sensors and system for in-situ edge ring erosion monitor

2. 11955318 - Ash rate recovery method in plasma strip chamber

3. 11488812 - Method and apparatus for reducing particle defects in plasma etch chambers

4. D931240 - Substrate support pedestal

5. 11094511 - Processing chamber with substrate edge enhancement processing

6. 11088000 - Wafer based corrosion and time dependent chemical effects

7. 10658161 - Method and apparatus for reducing particle defects in plasma etch chambers

8. 10515862 - Wafer based corrosion and time dependent chemical effects

9. 10217627 - Methods of non-destructive post tungsten etch residue removal

10. 9885567 - Substrate placement detection in semiconductor equipment using thermal response characteristics

11. 9155184 - Plasma generation source employing dielectric conduit assemblies having removable interfaces and related assemblies and methods

12. 8771423 - Low sloped edge ring for plasma processing chamber

13. 8287650 - Low sloped edge ring for plasma processing chamber

14. 8101025 - Method for controlling corrosion of a substrate

15. 7807579 - Hydrogen ashing enhanced with water vapor and diluent gas

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