This inventor holds 5 USPTO granted patents and 2 published patent applications. Top assignees: Intel Corporation, Silicon Magnetic Systems. Active years: 2004-2022.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2004-2022
Title: Chang Ju Choi: Innovator in Photomask Technology
Introduction
Chang Ju Choi is a prominent inventor based in Fremont, California, known for his significant contributions to the field of photomask technology. With a total of five patents to his name, he has made remarkable advancements that have impacted the semiconductor industry.
Latest Patents
One of his latest patents involves the development of extreme ultraviolet (EUV) phase-shift SRAF masks through embedded phase shift layers. This innovation includes a substrate and a mirror layer, which consists of alternating first and second mirror layers. Additionally, a phase-shift layer is formed over the mirror layer, incorporating openings for both printable and non-printable features. Notably, the non-printable features are designed to be smaller than the printable ones. Another significant patent focuses on photomask processing techniques aimed at enhancing critical dimension (CD) resolution. These techniques can independently improve space and line pattern resolution on a phase-shifting photomask, extending existing photolithography technologies to produce high-resolution photomasks for integrated circuits.
Career Highlights
Throughout his career, Chang Ju Choi has worked with leading companies in the technology sector, including Intel Corporation and Silicon Magnetic Systems. His expertise in photomask technology has positioned him as a key player in the development of advanced semiconductor manufacturing processes.
Collaborations
Chang has collaborated with notable professionals in his field, including Sam G Geha and Benjamin C E Schwarz. These collaborations have further enriched his work and contributed to the advancements in photomask technology.
Conclusion
Chang Ju Choi's innovative contributions to photomask technology and his collaborations with industry experts highlight his significant role in the semiconductor field. His work continues to influence the development of high-resolution photomasks and advanced manufacturing techniques.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile