The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 12, 2022
Filed:
Jul. 25, 2018
Intel Corporation, Santa Clara, CA (US);
Robert Bristol, Portland, OR (US);
Guojing Zhang, Saratoga, CA (US);
Tristan Tronic, Aloha, OR (US);
John Magana, San Jose, CA (US);
Chang Ju Choi, Fremont, CA (US);
Arvind Sundaramurthy, Menlo Park, CA (US);
Richard Schenker, Portland, OR (US);
Intel Corporation, Santa Clara, CA (US);
Abstract
Embodiments described herein comprise extreme ultraviolet (EUV) reticles and methods of forming EUV reticles. In an embodiment, the reticle may comprise a substrate and a mirror layer over the substrate. In an embodiment, the mirror layer comprises a plurality of alternating first mirror layers and second mirror layers. In an embodiment, a phase-shift layer is formed over the mirror layer. In an embodiment, openings for printable features and openings for non-printable features are formed into the phase-shift layer. In an embodiment, the non-printable features have a dimension that is smaller than a dimension of the printable features.