This inventor holds 9 USPTO granted patents and 1 published patent application and 1 EPO patent. Top assignee: Intel Corporation. Active years: 2005-2026.
Company Filing History:
Years Active: 2005-2026
Title: John Magana: Innovator in Semiconductor Technology
Introduction
John Magana is a prominent inventor based in San Jose, California. He has made significant contributions to the field of semiconductor technology, holding a total of 9 patents. His work focuses on advancements in extreme ultraviolet lithography, which is crucial for the fabrication of modern microchips.
Latest Patents
One of his latest patents is titled "Real-time detection of deflections and ruptures of EUV pellicle membranes." This invention involves a reticle assembly that includes a pellicle support frame and a sensor assembly with optical and sensor components. These components monitor the pellicle, ensuring its integrity during semiconductor manufacturing processes. Another notable patent is "Method and apparatus for fabrication of very large scale integration pattern features via electroless deposition on extreme ultraviolet lithography photomasks." This patent describes methods for forming EUV reticles, which are essential for producing high-resolution patterns on semiconductor wafers.
Career Highlights
John Magana is currently employed at Intel Corporation, where he continues to innovate in the semiconductor industry. His expertise in EUV technology has positioned him as a key player in the development of next-generation microchips.
Collaborations
Throughout his career, John has collaborated with notable colleagues, including Guojing Zhang and M Lawrence A Dass. These partnerships have fostered a collaborative environment that enhances innovation and drives technological advancements.
Conclusion
John Magana's contributions to semiconductor technology through his patents and collaborations highlight his role as a leading inventor in the field. His work continues to influence the future of microchip manufacturing and innovation.