Location History:
- Chu Tung Town, TW (1998)
- Hsinchu Hsien, TW (2000 - 2001)
- Hsinchu, TW (2000 - 2004)
Company Filing History:
5 out of 357 
4 out of 442 
2 out of 30,045 
Years Active: 1998-2004
Title: Champion Yi: Innovator in Chemical Mechanical Polishing
Introduction
Champion Yi is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of chemical mechanical polishing (CMP) with a total of 10 patents to his name. His innovative approaches have advanced the technology used in semiconductor manufacturing.
Latest Patents
Among his latest patents, Champion Yi has developed a polishing tool specifically designed for the CMP process. This polishing tool features a platen that holds a wafer faced-up, allowing it to move back and forth between two positions. It includes a polishing pad that polishes the wafer and a holder that enables the polishing pad to self-rotate while moving across the wafer surface. Another notable patent involves a method of polishing a wafer that has an oxide layer with at least one via. This method ensures that the metal layer formed on the oxide layer is polished effectively, utilizing a composite polishing pad with varying hardness levels.
Career Highlights
Throughout his career, Champion Yi has worked with several notable companies, including Promos Technologies, Inc. and Mosel Vitelic Corporation. His experience in these organizations has allowed him to refine his skills and contribute to advancements in CMP technology.
Collaborations
Champion Yi has collaborated with talented individuals in his field, including Jiun-Fang Wang and Ming-Cheng Yang. These partnerships have fostered innovation and have been instrumental in the development of his patented technologies.
Conclusion
Champion Yi's contributions to the field of chemical mechanical polishing have established him as a key figure in semiconductor manufacturing. His innovative patents and collaborations continue to influence the industry positively.