The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 25, 2000

Filed:

Jun. 03, 1999
Applicant:
Inventors:

Champion Yi, Hsinchu Hsien, TW;

Jen-Chieh Tung, Hsinchu, TW;

Jiun-Fang Wang, Hsin-chu, TW;

Assignees:

ProMos Technologies, Inc., Hsinchu, TW;

Mosel Vitelic, Inc., Hsinchu, TW;

Siemens AG, Muchen, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B / ; B24B / ;
U.S. Cl.
CPC ...
451 60 ; 451 28 ; 451910 ;
Abstract

A method and apparatus for conditioning a slurry used in a chemical mechanical polishing apparatus is disclosed. Megasonic generators are provided along the piping network between a slurry reservoir and the CMP apparatus. A megasonic generator may also be placed adjacent to the slurry reservoir. The megasonic generators discourage the formation of agglomerate particles, which in turn reduces the number of defects caused by the large particles in the slurry.


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