Company Filing History:
3 out of 357 
1 out of 442 
1 out of 30,045 
Years Active: 2000-2004
Title: Innovations of Inventor Jen-Chieh Tung
Introduction
Jen-Chieh Tung is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of chemical mechanical polishing (CMP) technology. With a total of 3 patents to his name, his work has advanced the efficiency and effectiveness of semiconductor wafer processing.
Latest Patents
One of his latest patents is a "Chemical mechanical polishing apparatus, profile control system and conditioning method thereof." This invention features a profile control system designed to manage the profile of a polishing pad. The system includes a polishing pad, a polishing table, a polishing head, and a conditioner. The polishing pad is equipped with a transparent region, allowing for precise control of the polishing process. The system utilizes an illuminant, a detector, and a processor to determine the thickness of the polishing pad and adjust the processing recipes accordingly. This innovation aims to achieve a desired pad profile and reduce variations in wafer uniformity.
Another significant patent is the "Slurry supply system disposed above the rotating platen of a chemical mechanical polishing apparatus." This system includes a wafer carrier that holds a semiconductor wafer for polishing. It features a supporting arm and a slurry supplier positioned strategically to ensure effective delivery of polishing fluids. The design allows for individual control of the chemical mechanical polishing fluids through multiple openings on the slurry supplier.
Career Highlights
Throughout his career, Jen-Chieh Tung has worked with prominent companies in the semiconductor industry, including Promos Technologies, Inc. and Mosel Vitelic Corporation. His experience in these organizations has contributed to his expertise in CMP technology and innovation.
Collaborations
Jen-Chieh Tung has collaborated with talented individuals such as Yu-Wei Chin and Kuan-Fu Chang. These partnerships have fostered a creative environment that has led to the development of groundbreaking technologies in the field.
Conclusion
Jen-Chieh Tung's contributions to the field of chemical mechanical polishing have been invaluable. His innovative patents and collaborative efforts continue to shape the future of semiconductor processing technology.