Location History:
- Hsinchu, TW (2003 - 2006)
- Tainan, TW (2004 - 2006)
- Tai Nan Hsien, TW (2006 - 2009)
Company Filing History:
9 out of 9,157 
2 out of 32 
2 out of 980 
Years Active: 2003-2009
Title: Chai-Yuan Sheu: Innovator in Thin Film Transistor Technology
Introduction
Chai-Yuan Sheu is a prominent inventor based in Tainan, Taiwan. He has made significant contributions to the field of thin film transistors (TFTs), holding a total of 9 patents. His innovative approaches have advanced the manufacturing processes and efficiency of TFT technology.
Latest Patents
One of his latest patents is a manufacturing method for a TFT electrode designed to prevent metal layer diffusion. This method involves several steps, including providing a substrate, forming a first metal layer, and performing photolithography and etching processes to create a gate electrode. Additionally, a transparent conducting electrode is formed to cover the gate electrode, which helps prevent metal ion diffusion during fabrication. Another notable patent is a method of fabricating a TFT array that utilizes ion replacement through oxidation-reduction processes. This innovative approach addresses challenges associated with metal etching and achieves automatic alignment, replacing traditional lithographic techniques.
Career Highlights
Chai-Yuan Sheu has worked with esteemed organizations such as the Industrial Technology Research Institute and the Taiwan TFT LCD Association. His experience in these institutions has allowed him to refine his expertise in TFT technology and contribute to various advancements in the field.
Collaborations
Throughout his career, Chai-Yuan has collaborated with notable colleagues, including Chi-Shen Lee and Yu-Chang Sun. These partnerships have fostered a collaborative environment that has led to significant innovations in TFT technology.
Conclusion
Chai-Yuan Sheu's contributions to the field of thin film transistors are noteworthy, with his innovative patents and collaborations paving the way for advancements in manufacturing processes. His work continues to influence the industry and inspire future innovations.