This inventor holds 15 USPTO granted patents. Top assignee: Tokyo Electron Limited. Active years: 2008-2012.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2008-2012
Title: The Innovative Contributions of Cai Zhong Tian
Introduction
Cai Zhong Tian is a prominent inventor based in Amagasaki, Japan. He has made significant contributions to the field of plasma processing technology, holding a total of 15 patents. His work focuses on enhancing the efficiency and effectiveness of microwave plasma processing devices.
Latest Patents
Cai Zhong Tian's latest patents include a microwave plasma processing device and a gate valve specifically designed for such devices. The gate valve features a plate-shaped valve element that is rectangular to match the opening of a processing chamber, ensuring a size larger than the opening for optimal performance. It incorporates a hermetically sealing member that provides airtight sealing by pressing against the outer side of the processing chamber. Additionally, a microwave reflecting mechanism surrounds the hermetically sealing member, enhancing the device's functionality. Another notable patent is for a plasma processing apparatus and method, which processes wafers using plasma generated by microwave supply. This apparatus includes a transmissive window with a unique hanging portion that minimizes the generation of strong electric fields and reduces the amount of sputtered particles reaching the wafer.
Career Highlights
Cai Zhong Tian has established himself as a key figure in the field of plasma processing technology. His innovative designs and patents have contributed to advancements in the industry, particularly in improving the performance of plasma processing equipment. He is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment sector.
Collaborations
Cai Zhong Tian has collaborated with notable colleagues such as Junichi Kitagawa and Kinya Ota. Their combined expertise has fostered a productive environment for innovation and development in plasma processing technologies.
Conclusion
Cai Zhong Tian's contributions to the field of plasma processing are noteworthy, with his patents reflecting a commitment to innovation and excellence. His work continues to influence advancements in technology, making him a significant figure in the industry.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile