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For the Inventor, By the Inventor

Yongin-si, South Korea

Byeong-hwan Jeon

USPTO Granted Patents = 16 

Average Co-Inventor Count = 2.9

ph-index = 3

Forward Citations = 13(Granted Patents)


Company Filing History:

goldMedal16 out of 131,744 
 
Samsung Electronics Co., Ltd.
 patents

Years Active: 2014-2023

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16 patents (USPTO):Explore Patents
1. 11615956 - Light generator including debris shielding assembly, photolithographic apparatus including the light generator (2023-03-28),
2. 11114298 - Light generator including debris shielding assembly, photolithographic apparatus including the light generator, and method of manufacturing integrated circuit device using the photolithographic apparatus (2021-09-07),
3. 10890527 - EUV mask inspection apparatus and method, and EUV mask manufacturing method including EUV mask inspection method (2021-01-12),
4. 10431505 - Method of inspecting surface having a minute pattern based on detecting light reflected from metal layer on the surface (2019-10-01),
5. 10338370 - Clock signal generators and substrate inspecting apparatuses having the same (2019-07-02),
6. 10001444 - Surface inspecting method (2018-06-19),
7. 9983144 - Plasma light source and inspection apparatus including the same (2018-05-29),
8. 9903705 - Apparatus for focus control and method for manufacturing semiconductor device (2018-02-27),
9. 9897552 - Optical transformation module and optical measurement system, and method of manufacturing a semiconductor device using optical transformation module and optical measurement system (2018-02-20),
10. 9839110 - Plasma light source apparatus and light source system including the same (2017-12-05),
11. 9746430 - Optical inspecting apparatus (2017-08-29),
12. 9702826 - Method of inspecting a surface of an object and optical system for performing the same (2017-07-11),
13. 9546772 - Rod lens for lighting apparatus, lighting apparatus including the same and semiconductor manufacturing method using the apparatus (2017-01-17),
14. 9374883 - Plasma light source apparatus and plasma light generating method (2016-06-21),
15. 9305764 - Plasma light source, inspection apparatus including plasma light source, and method of generating plasma light (2016-04-05),

Title: Innovations of Byeong-hwan Jeon

Introduction

Byeong-hwan Jeon is a prominent inventor based in Yongin-si, South Korea. He has made significant contributions to the field of photolithography and integrated circuit manufacturing. With a total of 16 patents to his name, Jeon has established himself as a key figure in technological advancements.

Latest Patents

His latest patents include a light generator featuring a debris shielding assembly and a photolithographic apparatus that utilizes this innovative light generator. The method of manufacturing an integrated circuit (IC) device involves forming a photoresist layer on a substrate and exposing it to light using the photolithographic apparatus. The light generator is designed with a chamber that contains a plasma generation space, an optical element, and a debris shielding assembly. This assembly includes a protective film that faces the optical element, maintaining a protective space that includes an optical path. The protective frame supports the protective film and shields the protective space from the plasma generation area.

Career Highlights

Jeon is currently employed at Samsung Electronics Co., Ltd., where he continues to push the boundaries of innovation in his field. His work has been instrumental in enhancing the efficiency and effectiveness of integrated circuit manufacturing processes.

Collaborations

Some of his notable coworkers include Tae-joong Kim and Wook-rae Kim, who have collaborated with him on various projects, contributing to the success of their innovations.

Conclusion

Byeong-hwan Jeon's contributions to the field of photolithography and integrated circuit manufacturing are noteworthy. His innovative patents and ongoing work at Samsung Electronics Co., Ltd. highlight his importance in the realm of technology.

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