The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 05, 2016

Filed:

Feb. 04, 2015
Applicants:

Young-kyu Park, Incheon, KR;

Wook-rae Kim, Suwon-si, KR;

Kwang-soo Kim, Pyeongtaek-si, KR;

Tae-joong Kim, Hwaseong-si, KR;

Byeong-hwan Jeon, Yongin-si, KR;

Inventors:

Young-kyu Park, Incheon, KR;

Wook-rae Kim, Suwon-si, KR;

Kwang-soo Kim, Pyeongtaek-si, KR;

Tae-joong Kim, Hwaseong-si, KR;

Byeong-hwan Jeon, Yongin-si, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 61/28 (2006.01); H01J 65/04 (2006.01); G02B 27/14 (2006.01);
U.S. Cl.
CPC ...
H01J 65/044 (2013.01); G02B 27/141 (2013.01);
Abstract

A plasma light source includes a chamber having an ionizable medium therein, an ignition source configured to provide first electromagnetic radiation to the chamber, a sustaining source configured to separately provide second electromagnetic radiation to the chamber, a first curved mirror positioned adjacent the chamber, and a second curved mirror positioned opposite the first mirror and arranged to direct the first electromagnetic radiation toward the chamber. The second electromagnetic radiation may be different than the first electromagnetic radiation. Related devices and methods of operation are also discussed.


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