Budiman Sutedja

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Title: Innovator Spotlight: Budiman Sutedja and His Cutting-Edge Inventions

Introduction:

Budiman Sutedja, a brilliant inventor based in Venlo, Netherlands, has brought revolutionary ideas to the field of lithography with his innovative patents.

Latest Patents:

1. "Lithographic Apparatus and Method" - Budiman's patent introduces a lithographic apparatus that utilizes an electrostatic force to hold a substrate in place. The substrate carrier is equipped with its power source, enhancing efficiency and accuracy in the lithographic process.

2. "Lithographic Apparatus and Device Manufacturing Method" - This patent unveils a device manufacturing method that optimizes the projection of a patterned beam of radiation onto a substrate with multiple planar surfaces. By precisely aligning the beam's focal plane with different surface levels, Budiman's method achieves exceptional precision in device manufacturing.

Career Highlights:

Budiman Sutedja is a valued member of ASML Netherlands B.V., a leading company in the innovation of lithography technology. His expertise and dedication have significantly contributed to the advancement of lithographic processes within the company.

Collaborations:

Throughout his career, Budiman has collaborated with talented individuals like Rudy Jan Maria Pellens and Johannes Paulus Adrianus Maria Van Den Heuvel. Together, they have fueled innovation and pushed boundaries in the realm of lithography.

Conclusion:

Inventor Budiman Sutedja's creative genius and patented inventions have left an indelible mark on the landscape of lithography. His contributions have not only enhanced efficiency and precision in device manufacturing but have also inspired future innovations in the industry. Budiman's relentless pursuit of excellence continues to drive progress and shape the future of lithography technology.